With the continued need for shrinking pattern dimensions, semiconductor manufacturers continue to implement more complex patterning techniques, such as advanced multi-patterning, for the 10nm design ...

Fundamentals of Industrial Process, Measurement, and Control (FG05) is a lecture-based course that provides an overview of industrial measurement and control. Technicians, engineers and managers learn ...

Overlay control based on DI metrology of optical targets has been the primary basis for run-to-run process control for many years. In previous work we described a scenario where optical overlay ...

Onto Innovation Inc. (ONTO) recently augmented its award-winning Atlas family with the introduction of the Atlas G6 optical critical dimension (OCD) metrology system. Designed specifically for the era ...