Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

First HBA lithography system in the U.S. harnesses 65,000 parallel beams for unmatched flexibility, rapid prototyping and die-level traceability Hyper-Beam Array (HBA) Lithography System HBA is a new ...

This video demonstrates the pattern-free iron castings using Saguenay Foundry’s Nopatech. The company developed this new moulding technology to produce complex iron castings without pattern in just a ...

SAN JOSE, Calif.--(BUSINESS WIRE)--Cadence Design Systems, Inc. (Nasdaq: CDNS) today announced that its custom and analog/mixed-signal (AMS) IC design flow has achieved certification for Samsung ...