Abstract: In 45nm node and beyond with hyper NA lithography, mask topography effect is not ignorable and mask CD bias impacts printing performance such as MEEF or exposure latitude. In that situation, ...
Abstract: This paper reports a novel DRIE compensation mask pattern for fabricating an extremely thick sense-comb structure. When we attempted to fabricate a 300-μm-thick sense-comb structure to ...
The spontaneous formation of patterns by multiprotein systems is essential for orchestrating fundamental biological processes like cell division and embryogenesis. Although various membrane proteins ...
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