With continuous device scaling, process windows have become narrower and narrower due to smaller feature sizes and greater process step variability [1]. A key task during the R&D stage of ...

In this paper, we systematically evaluate a DRAM capacitor hole formation process that includes SADP and SAQP patterning, using virtual fabrication and statistical analysis in SEMulator3D. The purpose ...

Capacitor discharge circuits are used extensively in fast pulse generation. In such applications, the capacitor's stray inductance (or equivalent series inductance ...